Tetrakis(ethylmethylamino)silane
CAS No.:
477284-75-6
M. Wt:
260.49500
M. Fa:
C12H32N4Si
InChI Key:
MJBZMPMVOIEPQI-UHFFFAOYSA-N
Names and Identifiers of Tetrakis(ethylmethylamino)silane
CAS Number |
477284-75-6 |
|---|---|
EC Number |
684-494-9 |
MDL Number |
MFCD05663777 |
IUPAC Name |
N-methyl-N-tris[ethyl(methyl)amino]silylethanamine |
InChI |
InChI=1S/C12H32N4Si/c1-9-13(5)17(14(6)10-2,15(7)11-3)16(8)12-4/h9-12H2,1-8H3 |
InChIKey |
MJBZMPMVOIEPQI-UHFFFAOYSA-N |
Canonical SMILES |
CCN(C)[Si](N(C)CC)(N(C)CC)N(C)CC |
UNSPSC Code |
12352100 |
Physical and chemical properties of Tetrakis(ethylmethylamino)silane
Exact Mass |
260.24000 |
|---|---|
H Bond Acceptors |
4 |
H Bond Donors |
0 |
LogP |
1.22880 |
Molecular Formula |
C12H32N4Si |
Molecular Weight |
260.49500 |
PSA |
12.96000 |
Safety Information of Tetrakis(ethylmethylamino)silane
Applications of Tetrakis(ethylmethylamino)silane
Tetrakis(ethylmethylamino)silane has diverse applications across various fields:
- Thin Film Deposition: It is primarily used in the production of silicon nitride and silicon oxide films through chemical vapor deposition processes, which are crucial for semiconductor manufacturing.
- Coatings: The compound serves as a precursor for protective coatings that require enhanced thermal and chemical stability.
- Silicon-Based Materials: It contributes to the development of composite materials with improved mechanical properties and resistance to environmental degradation.
Interaction Studies of Tetrakis(ethylmethylamino)silane
Studies examining the interactions of tetrakis(ethylmethylamino)silane focus on its behavior during deposition processes and its interactions with substrates. For instance, research indicates that the compound's reactivity can significantly influence the morphology and properties of deposited films. Understanding these interactions is essential for optimizing deposition parameters and achieving desired film characteristics.
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